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Publikační činnost


I.    Odborné recenzované časopisy

  1. J. Musil, H. Jankovcová, V. Cibulka: Formation of Ti1-xSix and Ti1-xSixN Films by Magnetron Co-Sputtering, Czech. J. Phys. 49 (1999) 359 - 372

  2. J. Musil and H. PolákováHard Nanocomposite Zr-Y-N Coatings -Correlation between hardness and structure, Surf. Coat. Technol. 127 (2000) 99 – 106

  3. H. Poláková, M. Kubásek, R. Čerstvý and J. Musil: Control of Structure in Magnetron Sputtered Thin Films, Surf. Coat. Technol. 142 -144 (2001) 201-205

  4. J. Musil, P. Baroch, H. Poláková, J. Vlček, K.H. Nam, J.G. Han: Magnetron with gas injection through hollow cathodes machined in sputtered target, Surf. Coat. Technol. 148 (2001) 296-304

  5. J. Musil, H. Zeman, F. Kunc, H. Poláková and J. Vlček: Mechanical properties of hard and superhard nanocomposite coatings and problems in their measurements by microindentation, Surf. Coat. Technol. (2002)

  6. H. Poláková, J. Musil, J. Vlček, J.Allart, Ch. Mitterer: Structure-hardness relations in sputtered Ti-Al-V-N films, Thin Solid Films  444 (2003) 189-198

  7. J. Musil, H. Poláková, J. Šůna, J. Vlček:  Effect of ion bombardment on properties of hard reactively sputtered Ti(Fe)Nx films, Surf. Coat. Technol. 177-178 (2004) 289-298

II.   Příspěvky na konferencích

  1. H. Poláková, J. Musil, V. CibulkaFormation of Ti1-xSix and Ti1-xSixN Films by Magnetron Co-Sputtering, Proc. 12th Symposium on Applications of Plasma Processes, February 9-13, 1999, Liptovský Ján, p. 215

  2. J. Musil, H. Poláková, V. Cibulka: Properties of TiSi-N Films Prepared by Magnetron Co‑Sputtering, Proc. 14th International Symposium on Plasma Chemistry, August 2-6, 1999, Praha, Vol. III, p. 1611

  3. H. Poláková and J. MusilFormation of Ti1-xSi1-x and Ti1-xSixN Films By Magnetron Co-Sputtering, Proc. Materiálové vědy na prahu 3. Milénia, August 30 – September 1, 1999 Brno, p.49

  4. J. Musil and H. PolákováHard Nanocomposite Zr-Y-N Coatings. Correlation between hardness and structure, Proc. Second Asian-European International Conference on Plasma Surface Engineering, September 15-19, 1999, Beijing, Paper No.: Sat-0A3-2

  5. H. Poláková, M. Kubásek, R. Čerstvý and J. Musil: Enhanced Crystallization in Magnetron Sputtered Thin Films, Paper presented at 19th Symposium on Plasma Physics and Technology, June 6-9, 2000, Prague 

  6. H. Poláková, M. Kubásek, R. Čerstvý and J. Musil: Enhanced Crystallization in Magnetron Sputtered Thin Films, Abstr. 7th International Conference on Plasma Surface Engineereing, September 17-21, 2000, Garmisch-Partenkirchen, p.197

  7. . Musil, P. Baroch, H. Poláková, J. Vlček, K. H. Nam and J. G. Han: Magnetron with gas injection through hollow cathodes machined in sputtered target, Abstr. 28th International Conference on Metallurgical Coatings and Thin Films, April 30 – May 4, 2001, San Diego, USA, Paper No.: B4-1-5